There are many ways of Molybdenum Disulfide Coatings perparation which include physical vapor deposition, chemical vapor deposition, electroplating, electroless plating and so on. For a long period of time, MoS2 films prepared by vacuum plasma sputtering technology. This method can strictly control the film thickness, and can provide better film properties. However, it has the following disadvantages: It has very strict quality requirements of the sputtering target , generally it need to be replaced by a new target before the production of high quality thin films which makes consuming relatively large; (2) It must be configured sputtering target relative to the special shape of the corresponding supporting base, and the complex shape for the deposition of thin film and complex vacuum equipment used in prepration process which need large consume; (3) The ideal method of preservation thin films made by sputtering is curing treatment, but this will have many holes in the film surface which is vulnerable to chemical attack, resulting in decreased performance of the film; (4) It is not suitable for deposition of complex shape, large area films. Because of these drawbacks, people began to seek a better way to prepare MoS2 film. The author uses three kinds of MoS2 coated methods: boiling method, plating method (spraying) and electrophoretic deposition method to perpare the molybdenum disulfide coating and compared the performance of various coatings.